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首页> 外文期刊>Physica, B. Condensed Matter >Dependence of electrically detected magnetic resonance signal shape from iron-contaminated silicon wafers on the thermal treatment of the samples
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Dependence of electrically detected magnetic resonance signal shape from iron-contaminated silicon wafers on the thermal treatment of the samples

机译：来自铁污染的硅片的电检测磁共振信号形状对样品热处理的依赖性

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摘要

The shape of the electrically detected magnetic resonance (EDMR) signal from iron-contaminated Czochralski-grown silicon (CZ-Si) samples strongly depends on the thermal treatments applied to the samples before and after the contamination procedure, although the average g-value of the spectra apparently does not vary. A signal from an iron-contaminated float-zone grown silicon (FZ-Si) sample was detected employing an EDMR signal detection unit with enhanced sensitivity. For similar contamination levels, the signal from the FZ-Si sample has amplitude about 1/45 that of the CZ-Si signal and has specific shape. Further study of the EDMR signals from iron-contaminated Si samples will be useful for the investigation of gettering and recombination processes in Si wafers. Besides that, dependence of the EDMR spectrum shape on the thermal processes employed can help to pinpoint the process responsible for water contamination during semiconductor device fabrication.
机译：来自铁污染的切克劳斯基生长硅（CZ-Si）样品的电检测磁共振（EDMR）信号的形状在很大程度上取决于在污染程序之前和之后对样品进行的热处理，尽管光谱显然没有变化。使用具有增强的灵敏度的EDMR信号检测单元检测了来自铁污染的浮区生长硅（FZ-Si）样品的信号。对于相似的污染水平，来自FZ-Si样品的信号的幅度约为CZ-Si信号的幅度的1/45，并且具有特定的形状。进一步研究铁污染的硅样品中的EDMR信号将有助于研究硅晶片中的吸杂和复合过程。除此之外，EDMR光谱形状对所采用的热工艺的依赖性还可以帮助查明半导体器件制造过程中造成水污染的过程。

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