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Synthesis of Diamond Films by Microwave Generated Pulsed Plasmas

机译：微波产生脉冲等离子体合成金刚石薄膜

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The metastable growth of diamond films has been achieved by a number ofcontinuous plasma-enhanced chemical vapor deposition (CVD) methods. Of these, none have gained more attention than the CW microwave plasma-enhanced chemical vapor deposition technique. In this technique the amount of microwave power used is typically limited by the extent of substrate heating induced by plasma and microwave heating. Concomitantly, the restriction in the amount of microwave power that can be used also reduces the amount of reactants that are dissociated and hence the film's growth rate. The use of pulsed radio-frequency discharges of very high power to deposit thin films as recently been reported. This paper investigates the use of microwave induced pulsed plasma in the growth of diamond films.

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