EXOELECTRON EMISSION FROM THIN FILMS

机译：薄膜的超晶体发射

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Electron trapping in thin aluminum oxide films has been investigated through the measurement of electron emission obtained while heating the excited sample through the temperature range of 0-420oC. Eight aluminum oxide films of different thicknesses were fabricated; six by vacuum evaporation and two by atomization.

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Duane M. Mathias;
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年度 1965
页码 1-86
总页数 86
原文格式 PDF
正文语种 eng
中图分类工业技术;
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8. Use of Exoelectrons to Study Solid Films [R] . Rabinowicz, E., Connelly, M. 1979

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EXOELECTRON EMISSION FROM THIN FILMS

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