Development of An Integrated Proximity Effect Correction Scheme.

机译：综合邻近效应校正方案的研制。

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The specific aim of this project is to develop an integrated proximity effect correction package which can handle sub-0.1 micrometers feature size, heterogeneous substrates, exploits both of dose and shape modification, and is applicable to projection or multiple electron beam lithographic systems as well as single (Gaussian) beam systems. Also, the software is to be parallelized for fast correction exploiting a readily available network of workstations. As reported in the interim progress reports and this final progress report, the proposed research project has been successfully completed.

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作者
Lee, S.;
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年度 2001
页码 1-3
总页数 3
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
Computer programs; Lithography; Substrates; Electron beams; Heterogeneity; Hierarchies; Corrections; Integrated proximity effect correction scheme;

机译：计算机程序;光刻;基板;电子束;异质性;层次结构;校正;集成邻近效应校正方案;

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专利

1. Restricted Optical Proximity Effect Correction Pattern Generation Based on Optical Proximity Effect Correction-Design for Manufacturability Rule in Model-Based Optical Proximity Effect Correction [J] . Katsuhiko Harazaki, Tasuku Yoshioka, Kiyoshige Ohmori, Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2007,第9BPt1期

机译：基于光学邻近效应校正的受限光学邻近效应校正模式生成-基于模型的光学邻近效应校正中的可制造性规则设计
2. Early growth and markers of cardiovascular risk in Keralan children in the Integrated Child Development Scheme. [J] . Brown N., Sasidharan C. K., Fisher D. Public Health Nutrition . 2010,第7期

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3. Improvement of optical proximity-effect correction model accuracy by hybrid optical proximity-effect correction modeling and shrink correction technique for 10-nm node process [J] . Keiichiro Hitomi, Scott Halle, Marshal Miller, Journal of microanolithography, MEMS, and MOEMS . 2016,第3期

机译：通过10nm节点工艺的混合光学邻近效应校正建模和收缩校正技术提高光学邻近效应校正模型的准确性
4. Accurate proximity correction method with total-process proximity-based correction factor (TCF) [C] . Kohji Hashimoto, Toshiba Corp., Yokohama, Optical Microlithography XI . 1998

机译：基于全过程基于接近度的校正因子（TCF）的精确接近度校正方法
5. Unequal error protection with the RaptorQ forward error correction scheme. [D] . Elliadka, Keshava M. 2014

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6. Integrated Not Isolated: Defining Typological Proximity in an Integrated Multilingual Architecture [O] . Michael T. Putnam, Matthew Carlson, David Reitter -1

机译：集成而非孤立：在集成多语言体系结构中定义类型接近性
7. Inverse Lithography as a DFM Tool: Accelerating Design Rule Development with Model-Based Assist Feature Placement, Fast Optical Proximity Correction and Lithographic Hotspot Detection [O] . Steve Prinsa, James Blatchforda, Simon Changa, 2014

机译：反向光刻作为DFm工具：利用基于模型的辅助特征放置，快速光学邻近校正和光刻热点检测加速设计规则开发

Development of An Integrated Proximity Effect Correction Scheme.

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