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Surface Composition and Erosion Yields for CVD TiB sub 2 Films Subjected to Low Energy Deuterium Ion Bombardment

机译:CVD TiB sub 2薄膜在低能氘离子轰击下的表面组成和侵蚀产率

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The surface composition and low energy sputter yield of deuterium bombarded CVD TiB sub 2 films have been measured. The sputter yield increases with energy up to 1 keV where it reaches a maximum of 0.024 atoms/ion. Above 1 keV the yield decreases due to ion penetration effects. Surface composition measurements using Auger, x-ray photoelectron and secondary ion mass spectroscopies show that a surface layer about 200 A thick is depleted in B during 2 keV deuterium bombardment. This effect is attributed to preferential sputtering. Oxides and deuterides of titanium are also observed on the deuterium bombardment TiB sub 2 surface. (ERA citation 05:020917)

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