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Control method of patterning process, device manufacturing method, control system for lithographic apparatus and lithographic apparatus
Control method of patterning process, device manufacturing method, control system for lithographic apparatus and lithographic apparatus
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机译：图案化工艺的控制方法，器件制造方法，光刻设备的控制系统和光刻设备
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摘要
Performance measurement targets are used to measure the performance of a lithographic process after processing multiple substrates. In the setting step, the method selects an alignment mark type and alignment recipe from among a plurality of candidate mark types by referring to expected parameters of the patterning process. After exposing multiple test substrates using the patterning process, the preferred metrology target type and metrology recipe are selected by comparing the measured performance parameters (eg, overlays) of the patterning process as measured by the reference technique. Based on the measurement of the positioning mark and performance measurement target after the actual execution of the patterning process, the alignment mark type and/or recipe can be modified to jointly optimize the alignment mark and metrology target. Alternative run-to-run feedback strategies can also be compared during subsequent operation of the process.
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