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Method for forming cobalt layer using laser chemical vapor deposition and laser chemical vapor deposition device
Method for forming cobalt layer using laser chemical vapor deposition and laser chemical vapor deposition device
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机译：利用激光化学气相沉积形成钴层的方法和激光化学气相沉积装置
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摘要
The present invention provides a method of forming a cobalt film using laser chemical vapor deposition. According to the present invention, the method of forming a cobalt film comprises: a step of supplying Co_2(CO)_8 gas and carrier gas to a substrate; and a step of applying a laser beam to the Co_2(CO)_8 gas supplied to the substrate to deposit a cobalt film on the substrate by pyrolysis and/or photolysis of the Co_2(CO)_8 gas. According to the present invention, a cobalt (Co) thin film with excellent electric conductivity and purity can be deposited by a laser chemical vapor deposition process under a specific deposition condition. Also, simple selective pattern formation is possible by laser chemical vapor deposition capable of direct writing. Moreover, a repair process of a display panel with a narrow line width and low resistivity applicable to a high-resolution display panel can be provided.
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