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Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology
Optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology
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机译：使用光学临界尺寸（OCD）度量优化用于结构分析的光学参数模型
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摘要
Optimization of optical parametric models for structural analysis using optical critical dimension metrology is described. A method includes determining a first optical model fit for a parameter of a structure. The first optical model fit is based on a domain of quantities for a first model of the structure. A first near optical field response is determined for a first quantity of the domain of quantities and a second near optical field response is determined for a second, different quantity of the domain of quantities. The first and second near optical field responses are compared to locate a common region of high optical field intensity for the parameter of the structure. The first model of the structure is modified to provide a second, different model of the structure. A second, different optical model fit is determined for the parameter of the structure based on the second model of the structure.
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