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Thin film defect inspection for standard board, a method of manufacturing the same, and thin film defect inspection method

机译:用于标准板的薄膜缺陷检查,其制造方法以及薄膜缺陷检查方法

摘要

PROBLEM TO BE SOLVED: To provide a standard substrate which enables exact inspection of a defect existing in a thin film formed on a substrate.;SOLUTION: Fine particles 4, 5 having a known particle size and a uniform grading are attached to the surface of a substrate 1 having a clean surface. As such fine particles, fine particles made of polystyrene, polyacrylate, silica or the like, can be used. Subsequently, a thin film is formed on the surface of the substrate in such a state that the fine particles are attached thereto. As a result, the thin film in which the fine particles to get to model defects artificially formed are contained can be obtained. Subsequent to the formation of such a thin film, at least a part of the fine particles are released from the thin film 2 to form defect parts 3. Release of such fine particles can be performed by supersonic cleaning or scrub cleaning. The obtained defect parts 3 become pinholes, having uniform particle sizes in the thin film 2 and parts from which the fine particles are not released become protruded model defects.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:提供一种标准衬底,该衬底能够精确检查衬底上形成的薄膜中存在的缺陷。解决方案:将具有已知粒度和均匀渐变的细颗粒4、5附着到表面上。具有清洁表面的基板1。作为这样的微粒,可以使用由聚苯乙烯,聚丙烯酸酯,二氧化硅等制成的微粒。随后,以使微粒附着于其上的状态在基板的表面上形成薄膜。结果,可以获得其中包含人工建模的缺陷的微粒的薄膜。在形成这样的薄膜之后,从薄膜2释放至少一部分细颗粒以形成缺陷部分3。可以通过超声清洗或擦洗清洗来进行这样的细颗粒的释放。获得的缺陷部分3成为针孔,在薄膜2中具有均匀的粒径,而没有释放出细颗粒的部分成为突出的模型缺陷。;版权所有:(C)2010,JPO&INPIT

著录项

  • 公开/公告号JP5032396B2

    专利类型

  • 公开/公告日2012-09-26

    原文格式PDF

  • 申请/专利权人 信越化学工業株式会社;

    申请/专利号JP20080131565

  • 发明设计人 小島 幹夫;吉川 博樹;

    申请日2008-05-20

  • 分类号G03F1/84;G01N21/956;

  • 国家 JP

  • 入库时间 2022-08-21 17:40:06

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