首页> 外国专利> Producing a flat application material, useful for introducing a nanostructure on a molded body, comprises applying a mask having a nanostructure on a film, transferring nanostructured patterns of mask in film and removing mask from film

Producing a flat application material, useful for introducing a nanostructure on a molded body, comprises applying a mask having a nanostructure on a film, transferring nanostructured patterns of mask in film and removing mask from film

机译：产生用于在模制体上引入纳米结构的平面施加材料的步骤包括：在膜上施加具有纳米结构的掩模;在膜中转印掩模的纳米结构图案;以及从膜上去除掩模。

页面导航

摘要
著录项
相似文献

摘要

Producing a flat application material (1), comprises applying a mask having a nanostructure (2) on a film (3a), forming a nanostructure on and/or in the film by transferring the nanostructured patterns of the mask on and/or in the film and removing the mask from the film. Independent claims are included for: (1) the flat application material for introducing a nanostructure on a molded body; and (2) a molded component having a preferably three dimensional surface on which the flat application material is applied.

机译：制备平坦的施加材料（1），包括在膜（3a）上施加具有纳米结构（2）的掩模，通过在所述膜上和/或膜上转移掩模的纳米结构图案在膜上和/或膜上形成纳米结构。膜并从膜上取下面膜。包括以下独立权利要求：（1）用于在模制体上引入纳米结构的平面施加材料; （2）具有优选为三维表面的模制部件，在所述三维表面上施加了平面施加材料。

著录项

公开/公告号DE102008027040A1

专利类型
公开/公告日2009-12-17

原文格式PDF
申请/专利权人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.;
展开▼

申请/专利号DE20081027040
发明设计人 HOPPE EICKE TILO;STROHHOEFER CHRISTOF;
展开▼

申请日2008-06-06
分类号B82B3/00;B82B1/00;B29C59/00;B63B3/16;B64C1/12;B62D29/00;B01J13/00;
国家 DE
入库时间 2022-08-21 18:28:59

相似文献

专利
外文文献
中文文献