Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power

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  机译： 使用VHF-RF功率的等离子体增强CVD低K掺杂碳的氧化硅膜沉积

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  机译： 使用乙硅烷作为硅前体的氧化硅膜和氟化氧化硅膜的低温等离子体增强化学气相沉积

• 5. PLASMA-ENHANCED AND RADICAL-BASED CVD OF POROUS CARBON-DOPED OXIDE FILMS ASSISTED BY RADICAL CURING [P] . 韩国专利： KR20160011150A . 2016-01-29

  机译： 自由基促进的多孔碳掺杂氧化物薄膜的等离子体增强和基于自由基的CVD

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• 1. Plasma Enhanced Chemical Vapour Deposition （PECVD） at Atmospheric Pressure （AP） of Organosilicon Films for Adhesion Promotion on Ti15V3Cr3Sn3Al and Ti6Al4V [J] . Jana Haag1 ,Tobias Mertens1 ,Max Kolb1 . 材料科学与工程：中英文A版 . 2015,第007期
• 2. Remote plasma-enhanced atomic layer deposition of gallium oxide thin films with NH_3 plasma pretreatment [J] . Hui Hao ,Xiao Chen ,Zhengcheng Li . 半导体学报：英文版 . 2019,第1期
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