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THE METHOD OF FABRICATION OF SEMICONDUCTING COMPOUNDS OF NITRIDES A3B5 OF p- AND n-TYPE ELECTRIC CONDUCTIVITY

机译:p型和n型电导率的氮化物A3B5的半导电化合物的制备方法

摘要

The subject of the invention is the method of fabrication of nitride semiconductor A3B5 such as GaN, AlN, InN or their solid solutions, characterized by p- or n-type conductivity, high intensity of emitted light and high structural quality. The semiconductors obtained by this method are applied in the construction of light emitting devices, light detectors and electric current amplifiers such as for example: highly efficient blue and green light diodes, laser diodes and high power lasers, ultraviolet detectors and high temperature field transistors. The method according to the invention is characterized by the fact that the homoepitaxial or heteroepitaxial layers of nitride semiconductors A3B5 are deposited on the conductive substrate after the introductory processing or isolating substrate, and after that the so prepared structures are located in high pressure diffusional chamber filled with the one or multi-component gas, compressed to pressure in the range 1000-20000 bar, and annealed in the temperature 1000-1800 °C in the prescribed time in the presence of the dopant from the external and/or internal source.
机译:本发明的主题是制造诸如GaN,AlN,InN或其固溶体的氮化物半导体A3B5的方法,其特征在于p型或n型导电性,高发射光强度和高结构质量。通过这种方法获得的半导体被用于发光器件,光检测器和电流放大器的构造中,例如:高效的蓝光和绿光二极管,激光二极管和大功率激光器,紫外线检测器和高温场晶体管。根据本发明的方法的特征在于以下事实:在引入处理或隔离衬底之后,将氮化物半导体A3B5的同质外延层或异质外延层沉积在导电衬底上,然后将如此制备的结构置于填充有高压扩散室中。用一种或多种成分的气体压缩至1000-20000 bar的压力,并在规定的时间内在温度为1000-1800°C的条件下进行退火,同时要有来自外部和/或内部源的掺杂剂。

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