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Silicon Carbide Single Crystal Wafers, Ingots and Their Manufacturing Methods

机译:碳化硅单晶晶片,锭及其制造方法

摘要

PROBLEM TO BE SOLVED: To provide a silicon carbide single crystal wafer and silicon carbide single crystal ingot having high quality, and a method for manufacturing a silicon carbide single crystal, capable of reducing dislocation defect density.SOLUTION: In the method for manufacturing a silicon carbide single crystal, capable of growing the crystal while contacting a silicon carbide seed crystal to a raw material solution including silicon and carbon from above, the crystal growth surface of the seed crystal has an off-angle inclined by 5 degrees or less and 0.5 degrees or more from a (000-1) plane, and the solution flow of the raw material solution during crystal growth forms an upward flow contacting a central portion of the seed crystal.SELECTED DRAWING: Figure 1
机译:要解决的问题:提供具有高质量的碳化硅单晶晶片和碳化硅单晶锭,以及用于制造碳化硅单晶的方法,能够减少位错缺陷密度。溶液:在制造硅的方法中碳化物单晶,能够在从上方将碳化硅籽晶体与硅和碳接触的原料溶液中的碳化物单晶,种子晶体的晶体生长表面具有5度或更小,0.5度的脱角。从(000-1)平面或更多来自晶体生长期间的原料溶液的溶液流动形成接触晶种的中心部分的向上流动。选择的绘图:图1

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