New Maskless Micro-Fabrication Technique of Single-crystal Silicon using the Combination of Nanometer-scale Machining and Wet Etching

机译：纳米加工与湿法刻蚀相结合的单晶硅无掩模微细加工新技术

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This paper describes a new maskless micro-fabrication technique using the combination of nanometer-scale mechanical machining and wet etching. First, the (100) surface of a single-crystal silicon is machined by using the nano-machining system, which utilises the mechanism of the friction force microscope (FFM.) Next, the material is etched by KOH solution. After the etching process, the convex structure or deeper hole is made because of the masking or promotion effect of the affected layer generated by nano-machining. To investigate this interesting effect, the affected layer was analysed. Moreover, some test structures were fabricated by using the masking effect.

机译：本文介绍了一种结合了纳米级机械加工和湿法蚀刻技术的新型无掩模微加工技术。首先，利用纳米加工系统对单晶硅的（100）表面进行加工，该系统利用了摩擦力显微镜（FFM）的机理。其次，该材料被KOH溶液蚀刻。在蚀刻工艺之后，由于纳米加工产生的受影响层的掩蔽或促进作用，形成了凸结构或更深的孔。为了研究这种有趣的效果，分析了受影响的层。此外，利用掩蔽效应制造了一些测试结构。

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来源
《2nd International EUSPEN Conference on Precision Engineering Nanotechnology Vol.1, May 27th-31st, 2001, Turin, Italy》|2001年|p.20-23|共4页
会议地点 Turin(IT)
作者
K. Ashida; L. Chen; N. Morita;
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MSE-AIST, Tsukuba, Japan;

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原文格式 PDF
正文语种 eng
中图分类机械、仪表工业;
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1. Micro-fabrication technique of single crystal silicon by using combination of nano-scale machining and alkaline etching [J] . Noboru Morita 砥粒加工学会誌 . 2001,第6期

机译：纳米加工与碱蚀相结合的单晶硅微细加工技术
2. Micro-fabrication technique of single crystal silicon by using combination of nano-scale machining and alkaline etching [J] . Noboru Morita 砥粒加工学会誌 . 2001,第6期

机译：采用纳米级加工和碱性蚀刻的单晶硅的微制造技术
3. Fabrication of GaN-based striped structures along the < 1120 > direction by the combination of RIE dry-etching and KOH wet-etching techniques to recover dry-etching damage [J] . Morimichi Itoh, Toru Kinoshita, Koji Kawasaki, Physica Status Solidi. C, Conferences and critical reviews . 2006,第6期

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4. New Maskless Micro-Fabrication Technique of Singlecrystal Silicon using the Combination of Nanometer-scale Machining and Wet Etching [C] . euspen European society for precision engineering and nanotechnology International Conference, european society for precision engineering and nanotechnology . 2001

机译：单型硅的新型无面罩微制造技术，使用纳米级加工和湿法蚀刻的组合
5. Mechanism of wet anisotropic etching of silicon for nano-scale applications. [D] . Stateikina, Irina. 2007

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6. Effect of Isopropyl Alcohol Concentration and Etching Time on Wet Chemical Anisotropic Etching of Low-Resistivity Crystalline Silicon Wafer [O] . Eyad Abdur-Rahman, Ibrahim Alghoraibi, Hassan Alkurdi 2017

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7. Micro-Fabrication of Single Crystal Silicon by Using Combination Technique of Nano-scale Machining and Alkaline Etching. [O] . Liyi CHEN, Noboru MORITA, Kiwamu ASHIDA 2001

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8. Technique for protecting chip corners in wet chemical etching of silicon wafers [R] . Hui, W. C. 1991

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New Maskless Micro-Fabrication Technique of Single-crystal Silicon using the Combination of Nanometer-scale Machining and Wet Etching

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