首页> 外文会议>3rd International Workshop on Microfactories Sep 16-18, 2002 Minneapolis, Minnesota USA >FABRICATION OF THICK Pb(Zr_x,Ti_(1-x))O_3 (PZT) FILM BY ELECTROISTATIC SPRAY DEPOSITION
【24h】

FABRICATION OF THICK Pb(Zr_x,Ti_(1-x))O_3 (PZT) FILM BY ELECTROISTATIC SPRAY DEPOSITION

机译:静电喷涂沉积制备厚Pb(Zr_x,Ti_(1-x))O_3(PZT)膜

获取原文
获取原文并翻译 | 示例

摘要

Strong pervoskite (100) oriented PZT thick films were prepared by a new-deposition method, named "electrostatic spray deposition (ESD)", using sol-gel solution as precursor. The electric properties of the film are comparable with that of the film prepared by sol-gel method, which makes it possible to apply ESD to MEMS technology for the fabrication of powerful microactuators.
机译:以溶胶-凝胶溶液为前体,通过一种称为“静电喷涂(ESD)”的新沉积方法,制备了坚固的坡方石(100)取向的PZT厚膜。该膜的电性能与通过溶胶-凝胶法制备的膜的电性能相当,这使得可以将ESD应用于MEMS技术以制造强大的微致动器。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号