首页> 外文会议>International workshop on microfactories >FABRICATION OF THICK Pb(Zr_x,Ti_(1-x))O_3 (PZT) FILM BY ELECTROISTATIC SPRAY DEPOSITION
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FABRICATION OF THICK Pb(Zr_x,Ti_(1-x))O_3 (PZT) FILM BY ELECTROISTATIC SPRAY DEPOSITION

机译:通过电磁喷涂沉积制造厚PB(Zr_x,Ti_(1-X))O_3(PZT)膜的膜

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Strong pervoskite (100) oriented PZT thick films were prepared by a new-deposition method, named "electrostatic spray deposition (ESD)", using sol-gel solution as precursor. The electric properties of the film are comparable with that of the film prepared by sol-gel method, which makes it possible to apply ESD to MEMS technology for the fabrication of powerful microactuators.
机译:通过使用溶胶 - 凝胶溶液作为前体,通过新沉积法制备“静电喷雾沉积(ESD)”的新沉积方法制备了强的Perovoskite(100)的PZT厚膜。薄膜的电性能与溶胶 - 凝胶法制备的薄膜相当,这使得可以将ESD施加到MEMS技术中用于制造强大的微致动器。

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