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Optical Rule Checking for Proximity Corrected Mask Shapes

机译：光学规则检查，以校正接近的掩模形状

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Optical Rule Checking (ORC) is an important vehicle to predict the failure of wafer shapes due to the process proximity effects. Optical Proximity Correction (OPC) if not aided by ORC may cause severe failures affecting the yield in manufacturing. However, it is fairly complicated to do ORC on mask shapes that are pre-corrected either by rules-based or by model-based OPC. ORC is also a good tool to capture the problems that may occur at multi-layer interactions. We present a methodology to use both geometric directives and limited optical simulation to detect potential failures using ORC. We extend our methodology to multi-layer interactions. In case of multi-layer ORC, we present several approaches that deal with how to judiciously mix the geometric directives and the optical simulations for different layers. We show the ORC can help us design better rules for OPC.
机译：光学规则检查（ORC）是预测由于工艺邻近效应而导致的晶圆形状故障的重要工具。如果没有ORC的帮助，光学邻近校正（OPC）可能会导致严重的故障，从而影响制造的良率。但是，对通过基于规则的OPC或基于模型的OPC预校正的蒙版形状进行ORC相当复杂。 ORC还是捕获多层交互中可能出现的问题的好工具。我们提出一种使用几何指令和有限光学仿真的方法，以使用ORC检测潜在的故障。我们将方法扩展到多层交互。在多层ORC的情况下，我们提供了几种方法来处理如何明智地混合使用不同层的几何指令和光学模拟。我们证明了ORC可以帮助我们为OPC设计更好的规则。

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