• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV >Spectral effects on x-ray lithography
【24h】

Spectral effects on x-ray lithography

机译：光谱对X射线光刻的影响

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Abstract: The actinic spectra of two beamlines of the University of Wisconsin's Center for X-ray Lithography (CXrL) at the Aladdin storage ring were studied in three configurations. Some beamlines optimized for particular bandwidths are presented and their impact on mask making, aerial image quality, printed image quality, and device damage discussed. Resist performance dependence on the actinic spectrum is investigated. The exposure- gap tree response of 0.25 micron features is presented for different spectra. Resist characteristic curve data were collected for these conditions and are compared. !16
机译：摘要：以三种配置研究了威斯康星大学X射线光刻技术中心（CXrL）在阿拉丁储存环上的两条光束线的光化光谱。介绍了针对特定带宽优化的一些光束线，并讨论了它们对掩模制造，航拍图像质量，打印图像质量和设备损坏的影响。研究了光化光谱对抗蚀剂性能的依赖性。给出了针对不同光谱的0.25微米特征的曝光间隙树响应。在这些条件下收集电阻特性曲线数据并进行比较。 ！16

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号