首页> 外文会议>International Conference on Molecular Beam Epitaxy, 11th, Sep 11-15, 2000, Beijing, China >MBE growth of mid-infrared antimonide LEDs with strained electron barriers
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MBE growth of mid-infrared antimonide LEDs with strained electron barriers

机译:具有应变电子势垒的中红外锑LED的MBE生长

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摘要

InAs/InAs_xSb_(1-x) single quantum well (SQW) p-i-n structures have been grown on p~+-InAs(00 1) substrates by molecular-beam epitaxy. Significant improvements in SQW light emitting diode performance have been realized by the incorporation of strained electron barrier layers. Room temperature performance has increased by a factor of up to 7. Additional 4K magneto-electro-luminescence measurements demonstrate the good materials quality.
机译:InAs / InAs_xSb_(1-x)单量子阱(SQW)p-i-n结构已通过分子束外延在p〜+ -InAs(00 1)衬底上生长。通过引入应变电子势垒层,已经实现了SQW发光二极管性能的显着改善。室温性能提高了7倍。另外的4K磁电致发光测量表明材料质量良好。

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