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Micromachined Sealed Cavities by Silicon Wafer Bonding for the Formation of Microstructures of Desired Thickness Using TMAH Etching

机译:通过硅晶片键合用于使用TMAH蚀刻形成所需厚度的微观结构的微机械晶片

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The present research report a fabrication process of suspended silicon microstructures of desired thickness over controlled depth micromachined cavities. The process is developed using direct wafer bonding to seal the micromachined cavities and wet anisotropic etching in pure and surfactant added tetramethyl ammonium hydroxide (TMAH) solutions. Wet anisotropic etching is used for the formation of cavities, thinning down the wafer for structural layer and releasing the structures. Non-ionic surfactant Triton-X-100 [C14H22O(C2H4O)n] added TMAH is used to realize the microstructures with rounded concave and sharp convex corners.
机译:本研究报告了在受控深度微机械腔中所需厚度的悬浮硅微结构的制造过程。该方法是使用直接晶片键合开发的,以密封微机械腔并在纯和表面活性剂中加入的四甲基氢氧化铵(TMAH)溶液中的湿各向异性蚀刻。湿的各向异性蚀刻用于形成空腔,缩短晶片以进行结构层并释放结构。非离子表面活性剂Triton-X-100 [C 14 H 22 O(C 2 H 4 O) N ]添加TMAH用于实现圆形凹凸和尖锐凸角的微观结构。

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