首页> 外文会议>Symposium on nitride semiconductors >DC AND MICROWAVE CHARACTERISTICS OF HIGH TRANSCONDUCTANCE ALGAN/GAN HETEROSTRUCTURE FIELD EFFECT TRANSISTORS ON SIC SUBSTRATES
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DC AND MICROWAVE CHARACTERISTICS OF HIGH TRANSCONDUCTANCE ALGAN/GAN HETEROSTRUCTURE FIELD EFFECT TRANSISTORS ON SIC SUBSTRATES

机译:SIC基板上高跨导AlGaN / GaN异质结构场效应晶体管的直流和微波特性

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High quality AlGaN/GaN heterostructures have been successfully deposited on both n-and p-type SiC substrates. Heterostructure field effect transistors fabricated using these layers exhibited high channel current density (1.71 A/mm), well behaved pinch-off characteristics, and excellent extrinsic transconductance (G_m = 229 mS/mm). There is negligible channel current degradation up to a source to drAlN bias of 20 V as opposed to devices grown on sapphire substrates. The 0.25 urn gate-length devices fabricated on the heterostructures grown on p-type SiC has allowed us to extract a cutoff frequency of 53 GHz. The cutoff frequency showed little deterioration with increasing drAlN bias voltage. These results demonstrate for the first time the high frequency and high power operation potential of the heterostructure field effect transistors based on AlGaN grown on SiC.
机译:高质量的AlGaN / GaN异质结构已成功沉积在N-and P型SiC基材上。使用这些层制造的异质结构场效应晶体管表现出高通道电流密度(1.71A / mm),表现良好的夹紧特性,以及出色的外部跨导(G_M = 229ms / mm)。频道电流劣化到20V的源极限偏差,而不是在蓝宝石基板上生长的设备。在P型SiC上生长的异质结构上制造的0.25瓮门长度允许我们提取53 GHz的截止频率。截止频率表明,随着DRALN偏置电压的增加而劣化。这些结果首次证明了基于AlGan在SiC上生长的异质结构场效应晶体管的高频和高功率运行电位。

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