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Lattice defects in SrRuO_3 thin films and their contribution to film resistivity

机译:Srruo_3薄膜的晶格缺陷及其​​对胶片电阻率的贡献

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Lattice defects present in PLD-grown, epitaxial SrRuO_3 thin films on (001) SrTiO_3 substrates are analyzed by high resolution transmission electron microscopy (HRTEM). Before the preparation of TEM samples, the electrical resistivity of films grown at different substrate temperatures was determined. Films grown at 775 deg C exhibited a low electrical resistivity of only 200 um OMEGA cm. They were found to be of orthorhombic structure and containd only few lattice defects. Films grown at 700 deg Cshowed a high electrical resistivikty of 1400 um OMEGA cm. They were of cubic lattice symmetry, while films grown at temperatures above 800 deg C showed resistivities between 300 and 900 um OMEGA cm. The latter films mainly consist of an orthorhombic-cubic phase mix and involve lattice defects of high density, such as twins and antiphase boundaries (APBs). These defects are mainly located in between the islands and obviously contribute to the high film resistivity observed. For example, the APBs contain an extra single SrO layer, which is certainly insulating. Moreover, Ru vacancies are present in these films.
机译:通过高分辨率透射电子显微镜(HRTEM)分析(001)SRTIO_3衬底上存在PLD生长的晶格缺陷,在(001)SRTIO_3衬底上进行分析。在制备TEM样品之前,确定在不同的基板温度下生长的薄膜的电阻率。在775℃下生长的薄膜表现出200微米ωcm的低电阻率。他们被发现是矫正球结构,只有几个晶格缺陷。在700℃下种植的电影ChaWed 1400 umega cm的高电阻。它们具有立方格晶格对称性,而在高于800℃的温度下生长的薄膜显示在300和900μmΩcm之间的电阻。后一部薄膜主要由正晶间 - 立方相混合组成,涉及高密度的晶格缺陷,例如双胞胎和反相界限(APB)。这些缺陷主要位于岛屿之间,并且显着促进观察到的高膜电阻率。例如,APB包含额外的单个SRO层,肯定是绝缘。此外,在这些薄膜中存在Ru空位。

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