Modern UV-lithography is searching for new highly parallel writing concepts. Spatial light modulation (SLM) offers such possibilities but special emphasis must be put on the ability of SLM devices to handle ultraviolet light (UV). We designed and fabricated micromirror arrays which fulfill these requirements. Possible applications for such UV-SLMs are direct writing systems for semiconductor and printing, and UV-stimulated biochemistry. For deep UV laser pattern generation (248 nm) e.g. we designed and fabricated a 2048 X 512 pixel UV-SLM with individually addressable aluminum micromirrors. They are illuminated by an excimer laser pulse and imaged onto a photomask substrate. A complete pattern is stitched together at a rate of 1 kHz. The minimum feature size is 320 nm and analog modulation of the pixels allows to realize an address grid of only 1.6 nm. The design of the array is modular so that other array sizes can be tailor made to customers needs. Design and fabrication aspects for a CMOS compatible realization of these micromirror arrays are addressed as well as their performance in lithography applications.
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机译：现代UV光刻正在寻找新的高度平行的写作概念。空间光调制（SLM）提供了这种可能性，但必须特别强调SLM器件处理紫外线（UV）的能力。我们设计和制造了微镜阵列，满足这些要求。这种UV-SLM的可能应用是用于半导体和印刷的直接写入系统，以及UV刺激的生物化学。对于深紫外激光模式生成（248nm）例如。我们设计并制造了一种带有可单独寻址的铝微镜的2048 x 512像素UV-SLM。它们由准分子激光脉冲照射并将其成像在光掩模衬底上。完整的图案以1 kHz的速率缝合在一起。最小特征大小为320nm，并且像素的模拟调制允许实现仅为1.6nm的地址网格。阵列的设计是模块化的，以便其他阵列大小可以量身定制给客户需求。用于CMOS兼容这些微镜阵列的兼容实现的设计和制造方面是解决的以及它们在光刻应用中的性能。
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