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首页> 外文会议>Conference on MOEMS and Miniaturized Systems Ⅱ Oct 22-24, 2001, San Francisco, USA >Design and Fabrication of Micromirror Arrays for UV-Lithography
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Design and Fabrication of Micromirror Arrays for UV-Lithography

机译：紫外光刻微镜阵列的设计与制作

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摘要

Modern UV-lithography is searching for new highly parallel writing concepts. Spatial light modulation (SLM) offers such possibilities but special emphasis must be put on the ability of SLM devices to handle ultraviolet light (UV). We designed and fabricated micromirror arrays which fulfill these requirements. Possible applications for such UV-SLMs are direct writing systems for semiconductor and printing, and UV-stimulated biochemistry. For deep UV laser pattern generation (248 nm) e.g. we designed and fabricated a 2048 X 512 pixel UV-SLM with individually addressable aluminum micromirrors. They are illuminated by an excimer laser pulse and imaged onto a photomask substrate. A complete pattern is stitched together at a rate of 1 kHz. The minimum feature size is 320 nm and analog modulation of the pixels allows to realize an address grid of only 1.6 nm. The design of the array is modular so that other array sizes can be tailor made to customers needs. Design and fabrication aspects for a CMOS compatible realization of these micromirror arrays are addressed as well as their performance in lithography applications.
机译：现代UV光刻正在寻找新的高度平行的书写概念。空间光调制（SLM）提供了这样的可能性，但是必须特别强调SLM设备处理紫外线（UV）的能力。我们设计并制造了满足这些要求的微镜阵列。这种UV-SLM的可能应用是用于半导体和印刷的直接写入系统，以及UV刺激的生物化学。用于深紫外激光图案生成（248 nm），例如我们设计并制造了带有单独可寻址铝微镜的2048 X 512像素UV-SLM。它们被准分子激光脉冲照射并成像到光掩模基板上。完整的图案以1 kHz的速率缝合在一起。最小特征尺寸为320 nm，像素的模拟调制允许实现仅1.6 nm的地址网格。阵列的设计是模块化的，因此可以根据客户需求量身定制其他阵列尺寸。这些微镜阵列的CMOS兼容实现的设计和制造方面以及它们在光刻应用中的性能都得到了解决。

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