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New nanofabrication technique using overlay for 15-nm zone plate

机译：新纳米制造技术使用覆盖为15nm区板

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Soft x-ray zone plate microscopy has proven to be a valuable imaging technique for nanoscale studies. It complements nano-analytic techniques such as electron and scanning probe microscopies, and offers a unique set of capabilities including high spatial resolution, natural elemental/chemical and magnetic sensitivities, large permissible sample thickness, and a myriad of in-situ sample environments. In this paper, a new zone plate fabrication technique based on overlaying complementary, semi-dense patterns is described. The new technique permits zone plates with sub-20 run zones, which are extremely challenging for conventional fabrication processes, to be fabricated. With the new technique, zone plates of 15 nm outermost zone width were successfully fabricated for the first time, yielding a spatial resolution better than 15 nm. Zone plates of 10 nm outer zones, as well as 3-D zone plate structures, which cannot be fabricated using conventional zone plate fabrication processes, are anticipated with the overlay technique.
机译：软X射线区板显微镜已被证明是纳米级研究的有价值的成像技术。它补充了纳米分析技术，例如电子和扫描探针显微镜，并提供独特的能力，包括高空间分辨率，天然元素/化学和磁性敏感性，允许的允许样品厚度，以及原位样品环境的大量样品。本文描述了一种基于覆盖互补的半致密图案的新区板制造技术。新技术允许带有子20运行区域的区域板，这对于传统的制造工艺来说是非常具有挑战性的。利用新技术，首次成功制造了15nm最外部区域宽度的区域板，产生优于15nm的空间分辨率。通过覆盖技术预期了使用常规区域板制造工艺的10nm外部区域的区域板以及3-D区板结构，覆盖技术预期。

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