Aluminum Ultra-Thin Films Grown by Physical Vapor Deposition for Solar Cell Electric Nanocontacts

机译：用于太阳能电池电动纳米纳米物理气相沉积的铝超薄薄膜

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As aluminum film thickness and feature size fall into nanoscale, drastic and abrupt changes in optical and electric material properties occur. Reduction of film thickness beyond a critical thickness results in island formation and local nanostructure variation. Sputter-deposited Al thin films on Si wafers were studied and the structure of grown nanofeatures is characterized. Aluminum island nanostructure formation has been studied for a variety of films with reference to critical thickness. Uniformly distributed Al nanoparticles with a diameter of 10 to 30 nm were formed on the silicon surface for an aimed average film thickness of 15nm. Transitions of resistivity, reflectance, and nanofeature size were observed for film thickness around 40 nm. Equally important, these properties appeared well correlated with the transformation of film nanostructure as the Al deposition proceeds.

机译：由于铝膜厚度和特征尺寸下降到纳米级，发生了光学和电材料特性的急剧和突然变化。减少超出临界厚度的膜厚度导致岛状形成和局部纳米结构变化。研究了Si晶片上的溅射型Al薄膜，并表征了生长纳米泡的结构。已经研究了铝岛纳米结构形成，用于参考临界厚度各种薄膜。在硅表面上形成直径为10至30nm的均匀分布的Al纳米颗粒，用于瞄准平均膜厚度为15nm。对于薄膜厚度约为40nm，观察到电阻率，反射率和纳米型尺寸的转变。同样重要的是，随着Al沉积所得的，这些性质与薄膜纳米结构的变换看起来良好相关。

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《Symposium on Photovoltaics for the Century》|2011年||共8页
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Abdennaceur Karoui;
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2. Continuous ultra-thin MoS2 films grown by low-temperature physical vapor deposition [J] . Muratore C., Hu J.J., Wang B., Applied Physics Letters . 2014,第26期

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Aluminum Ultra-Thin Films Grown by Physical Vapor Deposition for Solar Cell Electric Nanocontacts

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