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首页> 外文会议>Photovoltaics for the 21st century 7 >Aluminum Ultra-Thin Films Grown by Physical Vapor Deposition for Solar Cell Electric Nanocontacts
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Aluminum Ultra-Thin Films Grown by Physical Vapor Deposition for Solar Cell Electric Nanocontacts

机译：物理气相沉积法制备的太阳能电池电纳米接触铝超薄膜

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摘要

As aluminum film thickness and feature size fall into nanoscale, drastic and abrupt changes in optical and electric material properties occur. Reduction of film thickness beyond a critical thickness results in island formation and local nanostructure variation. Sputter-deposited Al thin films on Si wafers were studied and the structure of grown nanofeatures is characterized. Aluminum island nanostructure formation has been studied for a variety of films with reference to critical thickness. Uniformly distributed Al nanoparticles with a diameter of 10 to 30 nm were formed on the silicon surface for an aimed average film thickness of 15nm. Transitions of resistivity, reflectance, and nanofeature size were observed for film thickness around 40 nm. Equally important, these properties appeared well correlated with the transformation of film nanostructure as the Al deposition proceeds.
机译：随着铝膜的厚度和特征尺寸下降到纳米级，光学和电学材料特性发生急剧而突然的变化。将膜厚度减小到超过临界厚度会导致岛形成和局部纳米结构变化。研究了在硅晶片上溅射沉积的Al薄膜，并表征了生长的纳米特征的结构。关于临界厚度，已经研究了多种膜的铝岛纳米结构的形成。在硅表面上形成直径为10至30 nm的均匀分布的Al纳米颗粒，目标平均膜厚为15 nm。对于约40 nm的膜厚，观察到电阻率，反射率和纳米特征尺寸的转变。同样重要的是，随着Al沉积的进行，这些性能似乎与薄膜纳米结构的转变密切相关。

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