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首页> 外文会议>Conference on Metrology, Inspection, and Process Control for Microlithography >Design-Driven Metrology: a new paradigm for DFM-enabled process characterization and control: extensibility and limitations
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Design-Driven Metrology: a new paradigm for DFM-enabled process characterization and control: extensibility and limitations

机译：设计驱动的计量：启用DFM的流程表征和控制的新范式：可扩展性和限制

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After more than 2 years of development, Design-Driven Metrology (DDM) is now being introduced into production flows for semiconductor manufacturing, with initial applications targeted at 65 nm and below, but also backward-compatible to 90 nm and above nodes. This paper presents the fundamental components of the DDM framework, and the characteristic architectural relationships among these elements. The discussion includes current status and future prospects for this new metrology paradigm, which represents the true enabler for Design For Manufacturability (DFM) flows and applications. At the core of Design-Driven Metrology lies the simple but powerful concept of utilizing physical design layouts, and more specifically (X,Y) coordinates and polygonal shapes, to automate the generation of metrology jobs. Derived from 10 year old practices of Optical Proximity Correction, the adoption of CAD tools for visualization and manipulation of design layouts, in everyday lithography work, has provided the essential infrastructure for metrology automation. The in-depth discussion of data-flow and system architecture is followed by a presentation of key DDM applications, with specific emphasis on CDSEM metrology, ranging from process development and yield optimization to circuit design. The study concludes with an analysis of the extendibility of DDM and derived flows to other metrology areas in semiconductor manufacturing.
机译：经过2年多的发展后，设计驱动的计量学（DDM）正在被引入半导体制造的生产流程，初始应用靶向65nm和以下，而且还兼容为90nm和上述节点。本文介绍了DDM框架的基本组成部分，以及这些元素之间的特征架构关系。讨论包括此新计量范例的当前状态和未来前景，它代表了可制造性（DFM）流和应用程序设计的真实启动器。在设计驱动的计量核心中，利用物理设计布局的简单但强大的概念，更具体地说（x，y）坐标和多边形形状，以自动化计量作业。来自10岁的光学邻近校正做法，在日常光刻工作中采用设计布局的可视化和操纵设计布局，为计量自动化提供了基本基础设施。对数据流和系统架构的深入讨论之后是关键DDM应用的呈现，特别强调CDSEM计量，从过程开发和产量优化到电路设计。该研究结论，分析了DDM和衍生流到半导体制造中的其他计量区域的可扩散性。

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