• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography XX pt.1 >Design-Driven Metrology: a new paradigm for DFM-enabled process characterization and control: extensibility and limitations
【24h】

Design-Driven Metrology: a new paradigm for DFM-enabled process characterization and control: extensibility and limitations

机译：设计驱动的计量学：基于DFM的过程表征和控制的新范例：可扩展性和局限性

获取原文
获取原文并翻译 | 示例
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

After more than 2 years of development, Design-Driven Metrology (DDM) is now being introduced into production flows for semiconductor manufacturing, with initial applications targeted at 65 nm and below, but also backward-compatible to 90 nm and above nodes. This paper presents the fundamental components of the DDM framework, and the characteristic architectural relationships among these elements. The discussion includes current status and future prospects for this new metrology paradigm, which represents the true enabler for Design For Manufacturability (DFM) flows and applications. At the core of Design-Driven Metrology lies the simple but powerful concept of utilizing physical design layouts, and more specifically (X,Y) coordinates and polygonal shapes, to automate the generation of metrology jobs. Derived from 10 year old practices of Optical Proximity Correction, the adoption of CAD tools for visualization and manipulation of design layouts, in everyday lithography work, has provided the essential infrastructure for metrology automation. The in-depth discussion of data-flow and system architecture is followed by a presentation of key DDM applications, with specific emphasis on CDSEM metrology, ranging from process development and yield optimization to circuit design. The study concludes with an analysis of the extendibility of DDM and derived flows to other metrology areas in semiconductor manufacturing.
机译：经过2年多的开发，现在将设计驱动计量（DDM）引入半导体制造的生产流程中，其最初的应用目标是65 nm及以下，但还可以向后兼容90 nm及以上的节点。本文介绍了DDM框架的基本组件，以及这些元素之间的典型架构关系。讨论包括这种新计量范例的现状和未来前景，它代表了可制造性设计（DFM）流程和应用的真正推动者。设计驱动计量学的核心是简单而强大的概念，即利用物理设计布局，更具体地说是（X，Y）坐标和多边形形状来自动生成计量工作。源自近距离光学校正的10年实践，在日常光刻工作中采用CAD工具来可视化和处理设计版图，为计量自动化提供了必要的基础设施。在对数据流和系统体系结构的深入讨论之后，将介绍关键DDM应用，特别是CDSEM计量学，从过程开发和良率优化到电路设计。该研究最后分析了DDM的可扩展性以及派生到半导体制造中其他计量领域的流量。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号