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首页> 外文会议>Metrology, Inspection, and Process Control for Microlithography XX pt.2 >Bias reduction in roughness measurement through SEM noise removal
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Bias reduction in roughness measurement through SEM noise removal

机译：通过去除SEM噪声减少粗糙度测量的偏差

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The importance of Critical Dimension (CD) roughness metrics such as Line and Contact edge roughness (LER, CER) and their associated width metrics (LWR, CWR) have been dealt with widely in the literature and are becoming semiconductor industry standards. With the downscaling of semiconductor fabrication technology, the accuracy of these metrics is of increasing importance. One important challenge is to separate the image noise (present in any SEM image) from the physically present roughness. An approach for the removal of the non-systematic image noise was proposed by J.Villarrubia and B.Bunday [Proc. SPIE 5752, 480 (2005)]. In the presented work this approach is tested and extended to deal with the challenge of noise removal in the presence of various types of systematic phenomena present in the imaging process such as CD variation. The study was carried out by means of simulated LWR and using real measurements.
机译：关键尺寸（CD）粗糙度度量（如线和接触边缘粗糙度（LER，CER））及其相关宽度度量（LWR，CWR）的重要性已在文献中得到了广泛处理，并且正在成为半导体行业的标准。随着半导体制造技术的缩小，这些度量的准确性变得越来越重要。一个重要的挑战是将图像噪声（任何SEM图像中都存在）与物理粗糙度分开。 J.Villarrubia和B.Bunday提出了一种消除非系统图像噪声的方法。 SPIE 5752，480（2005）]。在提出的工作中，对这种方法进行了测试和扩展，以应对成像过程中存在的各种类型的系统现象（例如CD变化）中的噪声消除挑战。该研究是通过模拟LWR并使用实际测量进行的。

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