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PULSED LASER DEPOSITION OF HIGHLY CRYSTALLINE GaN FILMS ON SAPPHIRE

机译:在蓝宝石上脉冲激光沉积高结晶度GaN膜

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We report high quality epitaxial growth of GaN film by pulsed laser deposition technique. In this method, a KrF pulsed excimer laser was used for ablation of a polycrystalline, stoichiometric GaN target. The ablated material was deposited on a substrate kept at a distance of~7 cm from the target surface and in an NH_3 background pressure of 10~(-5) Torr and temperature of 750℃. The films (~0.5 μm thick) grown on A1N buffered sapphire showed a x-ray diffraction rocking curve FWHM of 4-6 arc minutes. The ion channeling minimum yield in the surface region was~3% indicating a high degree of crystallinity. The optical band gap was found to be 3.4 eV. The epitaxial films were shiny, and the surface RMS roughness was~5-15 nm. The electrical resistivity of these films was in the range of 10~(-2)-10~2 Ω-cm with a mobility in excess of 60 cm~2V~(-1)s~(-1) and carrier concentration of 10~(17)-10~(19)cm~(-3).
机译:我们通过脉冲激光沉积技术报告了高质量的GaN薄膜外延生长。在这种方法中,使用KrF脉冲准分子激光烧蚀多晶化学计量的GaN靶。烧蚀的材料沉积在距目标表面约7 cm的基底上,并且NH_3背景压力为10〜(-5)Torr,温度为750℃。在A1N缓冲蓝宝石上生长的膜(约0.5μm厚)显示4-6弧分的X射线衍射摇摆曲线FWHM。离子通道在表面区域的最小产率为〜3%,表明高度结晶。发现光学带隙为3.4eV。外延膜发亮,表面RMS粗糙度为〜5-15 nm。这些薄膜的电阻率在10〜(-2)-10〜2Ω-cm范围内,迁移率超过60 cm〜2V〜(-1)s〜(-1),载流子浓度为10 〜(17)-10〜(19)cm〜(-3)。

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