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Enhanced microlithography using coated objectives and image duplication

机译:使用涂层的物镜和图像复制技术增强微光刻

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Abstract: Two processes were investigated theoretically using both a scalar wave optics model and a microlithography simulation tool (Solid-C). The first method introduces a phase- transmission filter into the exit pupil plane. The results of both the scalar optics calculation (aerial image) and the Solid-C simulation (resist image) show that the final image profile is optimum, when the exit pupil plane filter is divided into two zones with the inner zone having a phase retardation of $pi rad with respect to the outer one and the ratio of the radii of the zones is 0.3. Using this optimized filter for the fabrication of isolated contact holes, the focus-exposure process window increases significantly, and the depth of focus (DOF) can be enhanced by a factor of 1.5 to 2. The second technique enhances the DOF of the aerial image by means of a birefringent plate inserted between the projection lens and the wafer. As the shift in focus introduced by the plate strongly depends on the refractive index, two focal points will appear when using a birefringent plate instead of an isotropic plate: the first one is created by the ordinary, and the second one is created by the extraordinary ray. The distance between these images can be controlled by the thickness of the plate. The results of the calculations show that application of a thin but strongly birefringent material is a better candidate than using a slightly birefringent but thick plate, since aberrations proportional to the thickness can cause undesirable effects. !11
机译:摘要:使用标量波光学模型和微光刻仿真工具(Solid-C)从理论上研究了两个过程。第一种方法将相透射滤波器引入出瞳平面。标量光学计算(航空影像)和Solid-C模拟(抗蚀剂影像)的结果均表明,当出射光瞳平面滤波器分为两个区域且内部区域具有相位延迟时,最终图像轮廓是最佳的$ pi rad相对于外圈的半径之和为0.3。使用这种优化的滤光片制造隔离的接触孔,可以大大增加焦点曝光过程的窗口,并且可以将焦点深度(DOF)增大1.5到2倍。第二种技术可以增强航拍图像的DOF。通过插入在投影透镜和晶片之间的双折射板来实现。由于板引起的焦点偏移很大程度上取决于折射率,因此在使用双折射板而不是各向同性板时会出现两个焦点:第一个是由平凡产生的,第二个是由非平凡产生的射线。这些图像之间的距离可以通过板的厚度来控制。计算结果表明,与使用略微双折射但较厚的板相比,使用薄而强双折射的材料是更好的选择,因为与厚度成比例的像差会导致不良影响。 !11

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