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首页> 外文会议>Optical Microlithography XI >Chromatic aberration-free TTL alignment system for 193-nm step-and-scan exposure system by using phase conjugate waves
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Chromatic aberration-free TTL alignment system for 193-nm step-and-scan exposure system by using phase conjugate waves

机译：使用相位共轭波的193 nm步进扫描曝光系统的无色差TTL对准系统

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Abstract: A TTL (through-the-lens) alignment system using the holographic phase conjugation in photopolymer films for application to ArF step-and-scan exposure system was designed, and the TTL alignment signals were obtained. The optical setup is similar to the DFWM (degenerate four-wave mixing). The recording materials were HRF 150 photopolymer films of Du Pont corporation, and the recording wavelength was 476 nm of argon ion laser with 400 mW output power. The diffraction efficiencies of photopolymer film were typically around 50%. Fine patterns as small as 1 micron were imaged successfully by the phase conjugate waves generated by DFWM holography. For TTL alignment, the 'X' or chevron patterns of the 1 or 2 micron linewidths were recorded as hologram and the reconstructed phase conjugate beams were used as the align beam through the projection lens which has strong chromatic aberration. TTL alignment signals were obtained by scanning the wafer with alignment mark under the align beam. !10
机译：摘要：设计了一种全息图对准系统，该方法利用光聚合物薄膜中的全息相位共轭技术，将其应用于ArF步进扫描曝光系统，并获得了TTL对准信号。光学设置类似于DFWM（简并四波混频）。记录材料是Du Pont公司的HRF 150光聚合物膜，并且记录波长是具有400mW输出功率的氩离子激光器的476nm。光敏聚合物薄膜的衍射效率通常约为50％。 DFWM全息图产生的相位共轭波成功地拍摄了小至1微米的精细图案。对于TTL对准，将1或2微米线宽的“ X”或V形图案记录为全息图，并将经过重建的相位共轭光束用作通过具有强色差的投影透镜的对准光束。通过在对准光束下用对准标记扫描晶圆来获得TTL对准信号。 ！10

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