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New method for improving the practical resolution of complex patterns in sub-half-micron lithography

机译：在亚半微米光刻中提高复杂图案的实际分辨率的新方法

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Abstract: A new approach, based on the optimization of illumination light by micro-optical element, is applied to improve the practical resolution of complex pattern in sub-half micron lithography. Several micro optical plates are devised to optimize the illumination light. Through the detailed theoretical expansion of the optics for the new structure, simulation of the aerial image is carried out. And the experiments verify the results of simulation. !7

机译：摘要：基于微光学元件优化照明光的一种新方法，被用于提高亚半微米光刻中复杂图案的实际分辨率。设计了几个微光学板来优化照明光。通过对新结构的光学器件进行详细的理论扩展，可以对航空影像进行仿真。实验验证了仿真结果。！7

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来源
《Optical Microlithography XI》|1998年|p.567-578|共12页
会议地点 Santa Clara CA(US)
作者
Xunan Chen; Institute of Optics; Electronics; Chengdu Sichuan; China; Xiangang Luo; Institute of Optics; Electronics; Sichuan; China; Hanmin Yao; Institute of Optics; Electronics; Shuangliu; Chengdu; China; Qian Xiao; Institute of Optics; Electronics; Academi;
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正文语种 eng
中图分类轻工业、手工业;
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New method for improving the practical resolution of complex patterns in sub-half-micron lithography

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