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首页> 外文会议>Optical Microlithography XIX pt.1 >Laser bandwidth and other sources of focus blur in lithography
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Laser bandwidth and other sources of focus blur in lithography

机译：光刻中的激光带宽和其他聚焦源模糊

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It is well known that the refractive optics used in today's exposure tools are highly chromatic, meaning that small wavelength shifts will cause large focus shifts. Even a line-narrowed excimer laser has a large enough range of wavelengths that we can no longer think of an infinitely thin image plane. The concept of "focus blur" can be generalized to encompass the effect of laser bandwidth chromatic aberrations, vertical stage vibrations (MSDz) and stage tilts which cause focus to change during the scan. This paper will introduce a new parameter called Mean Absolute Defocus (MAD) that can characterize the focus blur, and will be shown to correlate with the lithographic effects. Focus blur can be incorporated into simulation models, in a manner similar to the way that stage vibration is modeled. New simulation results will illustrate the impact of focus blur on modern lithographic processes. Process stability and machine-to-machine matching issues will be discussed.
机译：众所周知，当今的曝光工具中使用的折射光学系统是高度彩色的，这意味着小的波长偏移将导致较大的焦点偏移。即使是行窄的准分子激光器也具有足够大的波长范围，我们再也无法想到无限薄的像平面。可以将“聚焦模糊”的概念概括为涵盖激光带宽色差，垂直镜台振动（MSDz）和镜台倾斜的影响，这些影响会导致焦点在扫描过程中发生变化。本文将介绍一个新的参数，称为平均绝对散焦（MAD），它可以表征聚焦模糊，并且将显示出与光刻效果相关的参数。可以以类似于模拟舞台振动的方式将焦点模糊合并到仿真模型中。新的仿真结果将说明焦点模糊对现代光刻工艺的影响。将讨论过程稳定性和机器对机器的匹配问题。

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