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Anodization current density independent photoluminescence of porous silicon

机译:阳极氧化电流密度与多孔硅的光致发光无关

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Porous silicon (PS) is usually prepared by means of the anodization under constant current density, and fabrication of PS is a key step towards the realization of all-silicon electronic devices. It is a general belief that the photoluminescent properties of electrochemically etched PS depend on the anodization current density. In this work, we electrochemically prepared a series of PS films in the electrolyte of hydrofluoric acid by varying anodizing current density in the range of 1-70 mA/cm2. In spite of the different anodizing current density, the peak wavelength of the photoluminescence spectrum of the electrochemically anodized PS does not depend on the anodization current density. SEM has been utilized to characterize the morphology of the prepared PS films, and the mechanism is discussed for the anodization current independent photoluminescence of PS.
机译:通常通过在恒定电流密度下进行阳极氧化来制备多孔硅(PS),而PS的制造是实现全硅电子设备的关键一步。通常认为,电化学蚀刻的PS的光致发光性能取决于阳极氧化电流密度。在这项工作中,我们通过在1-70 mA / cm2的范围内改变阳极氧化电流密度,在氢氟酸电解质中电化学制备了一系列PS膜。尽管阳极氧化电流密度不同,但是电化学阳极氧化的PS的光致发光光谱的峰值波长并不取决于阳极氧化电流密度。 SEM已经被用来表征所制备的PS膜的形貌,并讨论了与阳极氧化电流无关的PS的光致发光机理。

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