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Spontaneous Crystalline Multilayer Formation in Ni Implanted Al at 100 K

机译:在100 K下Ni注入Al中自发形成多层晶体。

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The microstructure evolution of aluminum implanted with nickel at 5 MeV and at 100 K to a local concentration of 25 at. % is described. Transmission Electron Microscopy (TEM) observations and Rutherford Backscattering Spectrometry (RBS) experiments arc conducted to determine the Ni profile and the microstructure of the implanted samples. For lower Ni concentration. it has been previously observed that Al_(0.75)Ni_(0.25) amorphous precipitates arc formed together with a high dislocation density. When the Ni concentration reaches 25 at. %, a new crystalline multi-layered microstructure is observed: the TEM observations reveal the presence of well-defined crystalline layers separated by sharp interfaces. To our knowledge, it is the first time that such a structure is observed without further annealing of the implanted sample. A series of mechanisms describing the formation of the crystalline multilayer are briefly discussed. It is argued that its formation is the result of a recrystallization front produced by the exothermal amorphous to crystal transformation.
机译:在5 MeV和100 K下注入浓度为25 at。5的镍的铝的微观结构演变。描述了%。进行了透射电子显微镜(TEM)观察和卢瑟福背散射光谱(RBS)实验,以确定注入样品的镍分布和微观结构。用于降低镍浓度。先前已经观察到,Al_(0.75)Ni_(0.25)非晶沉淀物与高位错密度一起形成。当Ni浓度达到25at。 %,观察到新的晶体多层微结构:TEM观察表明存在清晰的晶体层,该晶体层被尖锐的界面分开。据我们所知,这是首次观察到这种结构而无需对植入的样品进行进一步退火。简要讨论了描述晶体多层形成的一系列机理。据认为,它的形成是由放热的非晶态向晶体转变产生的再结晶前沿的结果。

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