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首页> 外文会议>Symposium on Ion Beam Synthesis and Processing of Advanced Materials held Nov 27-29, 2000, Boston, Massachusetts, U.S.A. >Mechanical Properties of AIN Thin Films Prepared by Ion Beam Assisted Deposition
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Mechanical Properties of AIN Thin Films Prepared by Ion Beam Assisted Deposition

机译：离子束辅助沉积制备AIN薄膜的力学性能

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摘要

Aluminum nitride (AIN) thin films were prepared by ion-beam assisted deposition method, and the influence of the nitrogen ion beam energy on their microstructure and mechanical properties was studied by changing the ion beam energy from 0.1 to 1.5 keV. Films prepared with a low-energy ion beam show a columnar structure, while films prepared with a high-energy ion beam show a granular structure. The film hardness is found to decrease with increasing nitrogen ion beam energy. It is also found that the film hardness does not change drastically after annealing in nitrogen atmosphere at 500 ℃,yielding the residual stress relaxation. It is proposed that the film hardness is dependent on the film microstructure, which can be controlled with the nitrogen ion beam energy, rather than the residual stress in the films.
机译：采用离子束辅助沉积法制备了氮化铝（AIN）薄膜，通过将离子束能量从0.1 keV改变为1.5 keV，研究了氮离子束能量对其微观结构和力学性能的影响。用低能离子束制备的膜显示出柱状结构，而用高能离子束制备的膜显示出粒状结构。发现膜硬度随着氮离子束能量的增加而降低。还发现在氮气氛下于500℃退火后，膜的硬度没有急剧变化，残余应力松弛得到抑制。提出膜硬度取决于膜的微观结构，其可以通过氮离子束能量而不是膜中的残余应力来控制。

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