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Step and flash imprint lithography: A low-pressure, room-temperature nanoimprint lithography.

机译：分步和快速压印光刻：低压，室温纳米压印光刻。

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S&barbelow;tep and F&barbelow;lash I&barbelow;mprint L&barbelow;ithography (SFIL) is a technique that has the potential to replace photolithography for patterning resist with sub-100 nm features. SFIL is a bilayer lithographic scheme that utilizes the in situ photopolymerization of a low viscosity organosilicon monomeric fluid to replicate the topography of a template on an organic-coated substrate. The silylated relief structure is then etch transferred through the organic layer, which then can be used for subsequent processing such as additive metalization or device etch.; Several key aspects of the SFIL process have been investigated. Several means of fluid delivery have been evaluated and compression of multiple droplets has been determined to be the most consistent with high volume manufacturing requirements. The surface energies of the SFIL materials have been tailored to allow for preferential separation at the template-photopolymer interface. The mechanical properties and densification induced by photopolymerization have been studied as a function of photopolymer composition. The current photopolymer shrinks 9.3% (v/v) and has an elastic modulus of 4.2 MPa. Based on these experimentally determined properties and finite element simulation, the in-plane motion of replicated patterns was determined to be insignificant and that the effect of the densification manifests itself mainly in the direction normal to the substrate surface.; The photopolymer has been tailored to provide an O2 reactive ion etch selectivity greater than 10:1 with respect to an underlying organic film. Exploiting this selectivity, features with an aspect ratio of 14:1 were produced and high aspect ratio features have been printed over non-flat surfaces. The SFIL process has been successfully applied to optoelectronic structures such as micropolarizer arrays, and its resolution appears to be limited only by the size of the structures that can be created on the template. The Step and Flash Imprint Lithography process has been proven to be a high-resolution technique capable of patterning a wide variety of substrate at room temperature under low applied pressure in a fashion consistent with high volume manufacturing requirements.
机译：Sprint和lash Ithography（SFIL）是一种技术，该技术有可能用 sub -100 nm的特征代替光刻技术来图案化抗蚀剂。 SFIL是一种双层光刻方案，它利用低粘度有机硅单体流体的原位光聚合来复制模板在有机涂层基底上的形貌。然后将硅烷基化的凸版结构蚀刻穿过有机层，然后将其用于后续处理，例如添加金属化或器件蚀刻。 SFIL过程的几个关键方面已得到研究。已经评估了几种流体输送方式，并且确定了多个液滴的压缩与高产量制造要求最一致。调整了SFIL材料的表面能，以允许在模板-光聚合物界面处进行优先分离。已经研究了由光聚合引起的机械性能和致密化与光聚合物组成的关系。当前的光敏聚合物收缩9.3％（v / v）并且具有4.2MPa的弹性模量。基于这些实验确定的性质和有限元模拟，复制图案的平面内运动被认为是微不足道的，并且致密化的效果主要在垂直于基材表面的方向上显现出来。该光敏聚合物经过专门设计，可以提供相对于下面的有机膜大于10：1的O 2 反应离子蚀刻选择性。利用这种选择性，可以生产出长宽比为14：1的特征，并在非平坦表面上印刷了高长宽比的特征。 SFIL工艺已成功应用于光电结构，例如微偏振器阵列，其分辨率似乎仅受可在模板上创建的结构尺寸的限制。步进和快速压印光刻工艺已被证明是一种高分辨率技术，能够以符合大批量生产要求的方式在室温下以较低的施加压力对各种基材进行构图。

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