The solubility of lanthanum, copper and manganese salts in different .solvents was investigated, the appropriate solvent was selected. With lanthanum, copper and manganese salts as precursors, the wettability, stability and different substrate heat treatment were tested. The optimum precursor and substrate for the preparation of La2CuMnO6(LCMO) films buffer layer were successfully screened out. The phase composition and morphology of La2CuMnO6 film prepared by he chemical solution deposition(CSD) method were characterized using X-ray diffraction (XRD), atomic force microscope(AFM). The results show that, the La2CuMnO6 film prepared with the solution La(CHaCOO)3 · 1.5 H2O, Cu(CH3COO)2 · 1.0 H2O, Mn(CH3COO)2 · 4.0 H2O as precursor and SrTiO3 (STO) (100) as substrate, at 1000℃, thermal insulation of 3h, air atmosphere and total ion concentration 1.0mol/L, has good c-axis texture. The film surface is smooth, without cracks and holes, and is evenly distributed and arranged compactly, fully meeting the requirements of the film buffer layer.%根据镧、铜及锰盐在不同溶剂中的溶解性,选择合适的溶剂及镧、铜及锰盐为前驱体,配制成前驱溶液进行润湿性、稳定性及不同衬底热处理实验.成功筛选出制备La2CuMnO6(LCMO)缓冲层薄膜的前驱体,利用X射线衍射(XRD)和原子力显微镜(AFM)对化学溶液沉积法(CSD)合成的La2CuMno6薄膜的相组成和形貌结构进行了表征.结果表明,选择合适的前驱体(La(CH3COO)3·1.5H2O、Cu(CH3COO)2·1.0H2O、Mn(CH3COO)2·4.0H2O)及SrTiO3(STO)(100)衬底,在1000℃、保温时间3h、空气气氛及总离子浓度为1.0mol/L工艺条件下制备的La2CuMnO6薄膜具有很好的c轴织构,薄膜表面较平整、均匀、无裂纹、无孔洞,分布均匀且排列致密,完全满足缓冲层对薄膜的要求.
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