首页> 外文期刊>Applied Physics Letters >Impact of interfacial misfit dislocation growth mode on highly lattice-mismatched In_xGa_(1-x)Sb epilayer grown on GaAs substrate by metalorganic chemical vapor deposition
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Impact of interfacial misfit dislocation growth mode on highly lattice-mismatched In_xGa_(1-x)Sb epilayer grown on GaAs substrate by metalorganic chemical vapor deposition

机译:界面失配位错生长方式对金属有机化学气相沉积在GaAs衬底上生长的高度晶格失配的In_xGa_(1-x)Sb外延层的影响

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摘要

Highly lattice-mismatch (over 8%) ternary In_xGa_(1-x)Sb alloy directly grown on GaAs substrates was demonstrated by metalorganic chemical vapor deposition (MOCVD). The influence of growth parameters, such as growth temperature, indium vapor composition, and Ⅴ/Ⅲ ratio, on the film properties was investigated, and it was found that the growth temperature has the strongest effect on the surface morphology and the crystal quality of the In_xGa_(1-x)Sb epilayer. An optimized growth temperature of ~590 ℃ and a Ⅴ/Ⅲ ratio of 2.5 were used for the growth of the In_xGa_(1-x)Sb epilayer on GaAs that displays a lower surface roughness. High-resolution transmission electron microscopy micrographs exhibit that In_xGa_(1-x)Sb epilayer growth on GaAs was governed by the interfacial misfit dislocation growth mode. Furthermore, the variation of the intermixing layer thickness at the In_xGa_(1-x)Sb/GaAs heterointerface was observed. These results provide an information of growing highly lattice-mismatched epitaxial material systems by MOCVD growth process.
机译:通过金属有机化学气相沉积(MOCVD)证明了直接在GaAs衬底上生长的高度晶格不匹配(超过8%)的三元In_xGa_(1-x)Sb合金。研究了生长温度,铟蒸气组成和Ⅴ/Ⅲ比等生长参数对薄膜性能的影响,发现生长温度对薄膜的表面形貌和晶体质量影响最大。 In_xGa_(1-x)Sb外延层。在GaAs上生长的In_xGa_(1-x)Sb外延层的最适生长温度为〜590℃,Ⅴ/Ⅲ比为2.5。高分辨率透射电子显微镜显微照片显示In_xGa_(1-x)Sb外延层在GaAs上的生长受界面失配位错生长模式的控制。此外,观察到In_xGa_(1-x)Sb / GaAs异质界面处的混合层厚度的变化。这些结果提供了通过MOCVD生长工艺生长高度晶格失配的外延材料系统的信息。

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  • 来源
    《Applied Physics Letters》 |2016年第10期|102107.1-102107.4|共4页
  • 作者单位

    Department of Materials Science and Engineering, National Chiao-Tung University, 1001 University Road, Hsinchu 30010, Taiwan, R.O.C.;

    Department of Materials Science and Engineering, National Chiao-Tung University, 1001 University Road, Hsinchu 30010, Taiwan, R.O.C.;

    Department of Materials Science and Engineering, National Chiao-Tung University, 1001 University Road, Hsinchu 30010, Taiwan, R.O.C.;

    Department of Materials Science and Engineering, National Chiao-Tung University, 1001 University Road, Hsinchu 30010, Taiwan, R.O.C.;

    Department of Materials Science and Engineering, National Chiao-Tung University, 1001 University Road, Hsinchu 30010, Taiwan, R.O.C.;

    Department of Materials Science and Engineering, National Chiao-Tung University, 1001 University Road, Hsinchu 30010, Taiwan, R.O.C. ,Department of Electronics Engineering, National Chiao Tung University, 1001 University Road, Hsinchu 30010, Taiwan, R.O.C.;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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