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Analysis of crystal orientation in AlN layers grown on m-plane sapphire

机译:在m面蓝宝石上生长的AlN层中的晶体取向分析

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摘要

Our study reports on the microstructure of AlN layers grown on m-plane sapphire by metal organic vapor phase epitaxy. We have found that AlN can nucleate with three different orientations on the m-plane sapphire surface: semipolar (1122) and (1103) as well as m-plane (1100). Depending on the growth conditions, i.e. Ⅴ/Ⅲ ratio, the differently oriented crystallites exhibit different lateral and vertical growth rates. At a low Ⅴ/Ⅲ ratio of 626 the vertical growth rate of semipolar (1122) AlN regions is much lower than that of the (1103) and (1100) oriented grains, which results in an almost complete lateral overgrowth of the (1122) AlN oriented regions. In contrast, a high Ⅴ/Ⅲ ratio of 1043 leads to the formation of uniform semipolar (1122) AlN layers. Nevertheless, the formation of differently oriented AlN crystallites could not be suppressed completely. These randomly appearing crystallites still show a high vertical growth rate and lead to a deterioration of the surface morphology.
机译:我们的研究报告了通过金属有机气相外延在m面蓝宝石上生长的AlN层的微观结构。我们发现,AlN可以在m平面蓝宝石表面上以三种不同的方向成核:半极性(1122)和(1103)以及m平面(1100)。取决于生长条件,即Ⅴ/Ⅲ比率,不同取向的微晶表现出不同的横向和纵向生长速率。在较低的Ⅴ/Ⅲ比626下,半极性(1122)AlN区域的垂直生长速率远低于(1103)和(1100)取向晶粒的垂直生长速率,这导致(1122)的横向过度生长几乎完全AlN导向区域。相反,较高的Ⅴ/Ⅲ比1043导致形成均匀的半极性(1122)AlN层。然而,不能完全抑制取向不同的AlN微晶的形成。这些随机出现的微晶仍显示出高的垂直生长速率并导致表面形态的恶化。

著录项

  • 来源
    《Journal of Crystal Growth》 |2014年第15期|54-60|共7页
  • 作者单位

    Ferdinand-Braun-Institut, Leibniz-Institut fuer Hoechstfrequenztechnik, Berlin, Germany,Humboldt Universitaet zu Berlin, Institut fuer Physik, Berlin, Germany;

    Humboldt Universitaet zu Berlin, Institut fuer Physik, Berlin, Germany;

    Institut fuer Festkoerperphysik, Technische Universitaet Berlin, Berlin, Germany;

    Institut fuer Festkoerperphysik, Technische Universitaet Berlin, Berlin, Germany;

    Institut fuer Festkoerperphysik, Technische Universitaet Berlin, Berlin, Germany;

    Institut fuer Festkoerperphysik, Technische Universitaet Berlin, Berlin, Germany;

    Ferdinand-Braun-Institut, Leibniz-Institut fuer Hoechstfrequenztechnik, Berlin, Germany,Institut fuer Festkoerperphysik, Technische Universitaet Berlin, Berlin, Germany;

    Ferdinand-Braun-Institut, Leibniz-Institut fuer Hoechstfrequenztechnik, Berlin, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. Crystal structure; A1. Crystallites; A3. Metalorganic vapor phase epitaxy; B1. Nitrides; B2. Semiconducting Ⅲ-Ⅴ materials;

    机译:A1。晶体结构A1。晶体;A3。金属有机气相外延;B1。氮化物;B2。半导体Ⅲ-Ⅴ材料;

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