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首页> 外文期刊>Journal of Vacuum Science & Technology >Aspects of hybrid pattern definition while combining thermal nanoimprint with optical lithography
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Aspects of hybrid pattern definition while combining thermal nanoimprint with optical lithography

机译：同时将热纳米压印与光学光刻相结合的混合图案定义的各个方面

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摘要

Thermal nanoimprint (T-NIL) is uniquely suitable for combinational lithography because it proceeds without cross-linking and does not rely on changes in properties of the imprint material. Most typical are combinations with other lithography techniques. Combinations with optical lithography may help to circumvent the pattern size dependence of nanoimprint and help to remove the residual layer by a simple development step. This work focuses on a hybrid processing combining T-NIL with optical lithography by using a single resist layer. Critical issues are the imprintability of typical photoresists and the fact that lithography has to be performed over a prepatterned topography. A well-known positive tone photoresist, AZ 1500, is compared with a previously investigated negative tone resist, SU-8. Gel permeation chromatography reveals typical differences of these photoresists compared to typical imprint polymers. The results demonstrate that molecular mobility is a more important indicator for viscosity of photoresists than molecular weight. Additionally, a simple construction method was found to allow prediction of features typically encountered during hybrid patterning.
机译：热纳米压印（T-NIL）特别适用于组合光刻，因为它无需交联即可进行，并且不依赖压印材料性能的变化。最典型的是与其他光刻技术的组合。与光学光刻的组合可以帮助克服纳米压印的图案尺寸依赖性，并通过简单的显影步骤帮助去除残留层。这项工作的重点是通过使用单个抗蚀剂层将T-NIL与光学光刻相结合的混合工艺。关键问题是典型的光致抗蚀剂的可压印性以及必须在预先构图的形貌上执行光刻的事实。将众所周知的正性光刻胶AZ 1500与先前研究的负性光刻胶SU-8进行比较。凝胶渗透色谱显示与典型的印迹聚合物相比，这些光刻胶的典型差异。结果表明，分子迁移率是光致抗蚀剂粘度比分子量更重要的指标。另外，发现一种简单的构造方法可以预测混合图案化过程中通常遇到的特征。

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  • 来源
    《Journal of Vacuum Science & Technology》 |2010年第6期|p.C6M1-C6M6|共6页
  • 作者

    H.-C. Scheer; S. Moellenbeck; A. Mayer; K. Dhima;

  • 作者单位

    University of Wuppertal, Rainer-Gruenter Str. 21, D-42119 Wuppertal, Germany;

    University of Wuppertal, Rainer-Gruenter Str. 21, D-42119 Wuppertal, Germany;

    University of Wuppertal, Rainer-Gruenter Str. 21, D-42119 Wuppertal, Germany;

    University of Wuppertal, Rainer-Gruenter Str. 21, D-42119 Wuppertal, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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