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首页> 外文期刊>Thin Solid Films >Analysis of thin layers and interfaces in ITO/a-Si:H/c-Si heterojunction solar cell structures by secondary ion mass spectrometry
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Analysis of thin layers and interfaces in ITO/a-Si:H/c-Si heterojunction solar cell structures by secondary ion mass spectrometry

机译:二次离子质谱法分析ITO / a-Si:H / c-Si异质结太阳能电池结构中的薄层和界面

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Secondary ion mass spectrometry (SIMS) analysis of In, O, Si, and H concentrations versus depth distributions in ITO(In-Sn-O)/(n,p)a-Si:H/ (p,n)-Si and ITO/(p)-Si heterojunction (HJ) solar cell structures was performed. SIMS measurements show some peculiarities of the element profiles in the interface of ITO/a-Si:H and a-Si:H/Si regions. These peculiarities can be attributed to the non-homogeneities (In-rich nanostructures, small dents or mounds) of the ITO layer. It is shown that the formation of In-rich nanostructures is more pronounced in case of ITO growth on a (p)a-Si:H/(n) Si substrate at 230℃. SIMS profiles obtained from such non-homogeneous areas can show a penetration of In into the Si bulk, which is not a real distribution. A hydrogen redistribution from the a-Si:H layer into the neighboring ITO and Si layers in case of ITO/ (n,p)a-Si:H/(p,n)-Si structures as well as hydrogen gettering to the ITO/(p)-Si interface was detected. It is concluded that the final heterojunction structure of ITO/(n,p)a-Si:H/(p,n)c-Si is rather complex and includes in addition to the individual ITO, a-Si:H and Si layers also intermediate ones with different composition.
机译:二次离子质谱(SIMS)分析ITO(In-Sn-O)/(n,p)a-Si:H /(p,n)-Si和In中的In,O,Si和H浓度与深度分布进行了ITO /(p)-Si异质结(HJ)太阳能电池的结构。 SIMS测量显示了ITO / a-Si:H和a-Si:H / Si区域界面中元素分布的一些特殊性。这些特性可归因于ITO层的非均质性(富In纳米结构,小凹痕或土墩)。结果表明,在230℃下在(p)a-Si:H /(n)Si衬底上进行ITO生长时,富In纳米结构的形成更为明显。从这样的非均匀区域获得的SIMS剖面可以显示In渗透到Si块中,这不是真正的分布。在ITO /(n,p)a-Si:H /(p,n)-Si结构的情况下,氢从a-Si:H层重新分布到相邻的ITO和Si层中,以及氢吸杂到ITO检测到/(p)-Si接口。结论是,ITO /(n,p)a-Si:H /(p,n)c-Si的最终异质结结构相当复杂,除了单独的ITO外,还包括a-Si:H和Si层也是中间成分不同的。

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