Synthesis of polycrystalline silicon thin films with 'icosahedral' symmetry by ceramics hot wire chemical vapor deposition

Middya AR; Liang JJ; Ghosh K

首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Synthesis of polycrystalline silicon thin films with 'icosahedral' symmetry by ceramics hot wire chemical vapor deposition

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Synthesis of polycrystalline silicon thin films with 'icosahedral' symmetry by ceramics hot wire chemical vapor deposition

机译：陶瓷热丝化学气相沉积法合成“二十面体”对称的多晶硅薄膜

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We report on synthesis and materials physics of polycrystalline silicon thin films deposited on glass with rarely observed 'five-fold' symmetry or 'icosahedral' symmetry. We invented these 'novel form' of polycrystalline silicon thin films by ceramics hot wire chemical vapor deposition (hot-wire CVD). A new physical effect in hot-wire CVD technology has been proposed that controls the nucleation and growth of silicon thin films on glass substrate. (c) 2006 Elsevier B.V. All rights reserved.

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《Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites》 |2006年第20期|共3页
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Middya AR; Liang JJ; Ghosh K;
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正文语种 eng
中图分类晶体学;
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crystal growth; x-ray diffraction; chemical vapor deposition; scanning electron microscopy; atomic force and scanning tunneling microscopy;

机译：晶体生长;x射线衍射;化学气相沉积;扫描电镜;原子力和扫描隧道显微镜;

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1. Synthesis of polycrystalline silicon thin films with 'icosahedral' symmetry by ceramics hot wire chemical vapor deposition [J] . Middya AR, Liang JJ, Ghosh K Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2006,第9a20期

机译：陶瓷热丝化学气相沉积法合成“二十面体”对称的多晶硅薄膜
2. Ultrafast Deposition Of Silicon Nitride And Semiconductor Silicon Thin Films By Hot Wire Chemical Vapor Deposition [J] . R.E.I. Schropp, C.H.M. van der Werf, V. Verlaan, Thin Solid Films . 2009,第10期

机译：热线化学气相沉积法超快沉积氮化硅和半导体硅薄膜
3. Advances in hot wire chemical vapor deposition technology for the synthesis of novel silicon thin films materials [J] . Middya AR Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2006,第9a20期

机译：用于合成新型硅薄膜材料的热线化学气相沉积技术的进展
4. Synthesis of oriented and passivated polycrystalline silicon films on glass by hot wire chemical vapor deposition [C] . Kaur Gurleen, Hossion Md Abul, Kulasekaran M, IEEE Photovoltaic Specialists Conference . 2014

机译：热丝化学气相沉积法在玻璃上取向和钝化多晶硅膜的合成
5. Synthesis of large-grained polycrystalline silicon by hot-wire chemical vapor deposition for thin film photovoltaic applications. [D] . Mason, Maribeth Swiatek. 2004

机译：通过热线化学气相沉积法在薄膜光伏应用中合成大晶粒多晶硅。
6. Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films [O] . Mateusz Œmietana, Robert Mroczyński, Norbert Kwietniewski 2014

机译：射频等离子体增强化学气相沉积（RF PECVD）反应器中样品高度对氮化硅薄膜光学性能和沉积速率的影响
7. Synthesis of large-grained polycrystalline silicon by hot-wire chemical vapor deposition for thin film photovoltaic applications [O] . Mason Maribeth Swiatek 2004

机译：用于薄膜光伏应用的热线化学气相沉积法合成大颗粒多晶硅
8. Influence of Substrate Temperature and Hydrogen Dilution Ratio on the Properties of Nanocrystalline Silicon Thin Films Grown by Hot-Wire Chemical Vapor Deposition [R] . Moutinho, H. R., Jiang, C. S., Nelson, B., 2003

机译：衬底温度和氢稀释比对热线化学气相沉积法生长纳米硅薄膜性能的影响

Synthesis of polycrystalline silicon thin films with 'icosahedral' symmetry by ceramics hot wire chemical vapor deposition

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