Deposition of amorphous fluorosilane thin film on silicon surface: Atomic simulation

Gou FJ; Xu M; Sun WL; Chen T

首页> 外文期刊>Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites >Deposition of amorphous fluorosilane thin film on silicon surface: Atomic simulation

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Deposition of amorphous fluorosilane thin film on silicon surface: Atomic simulation

机译：硅表面上无定形氟硅烷薄膜的沉积：原子模拟

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We utilized the Tersoff-Brenner potential form potential to investigate SiF3 continuously bombarding silicon surface with energies of 10, 50 and 100 eV at normal incidence and room temperature by molecular dynamics method. The saturation of deposition yield of F and Si atoms on the surface is observed. A F-containing amorphous layer is formed whose thickness increases with incident energy. In the ejected gas-phase species, F, SiF and SiF2 species increases with increasing incident energy, while the amount of SiF3 species decreases. (c) 2007 Elsevier B.V. All rights reserved.

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《Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites》 |2007年第46期|共5页
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Gou FJ; Xu M; Sun WL; Chen T;
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正文语种 eng
中图分类晶体学;
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chemical vapor deposition; plasma deposition; modeling and simulation; MOLECULAR-DYNAMICS SIMULATIONS; SIF4/O-2 PLASMAS; SIF;

机译：化学气相沉积;等离子体沉积;建模与仿真;分子动力学模拟;SIF4 / O-2等离子体;SIF;

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1. Deposition of amorphous fluorosilane thin film on silicon surface: Atomic simulation [J] . Gou FJ, Xu M, Sun WL, Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2007,第44a46期

机译：硅表面上无定形氟硅烷薄膜的沉积：原子模拟
2. Photolithographic deposition of conducting gold films from thin amorphous films of AuPR3X (X = NO3, RCO2) on silicon surfaces [J] . Bravo-Vasquez JP., Hill RH. Polyhedron: The International Journal for Inorganic and Organometallic Chemistry . 2000,第3期

机译：在硅表面上用AuPR3X（X = NO3，RCO2）非晶态薄膜进行导电金膜的光刻沉积
3. Surface smoothing of amorphous silicon thin films: Kinetic Monte Carlo simulations [J] . X. Tan, G. Ouyang, G. W. Yang Physical review. B, Condensed Matter And Materials Physics . 2006,第19期

机译：非晶硅薄膜的表面平滑：动力学蒙特卡洛模拟
4. Surface Smoothing Effect of an Amorphous Thin Film Deposited by Chemical Vapor Deposition or Atomic Layer Deposition [C] . W.S. Lau, J. Zhang, X. Wan, China Semiconductor Technology International Conference . 2014

机译：化学气相沉积或原子层沉积沉积的非晶薄膜的表面平滑效果
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机译：研究硅衬底上的氧化物，硅化物和氮化物薄膜原子层沉积中的初始表面反应。
6. Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System [O] . Xiao-Ying Zhang, Chia-Hsun Hsu, Shui-Yang Lien, 2017

机译：利用远程等离子体原子层沉积系统沉积的HfO2薄膜对硅进行表面钝化
7. Surface smoothing effect of an amorphous thin film deposited by atomic layer deposition on a surface with nano-sized roughness [O] . W. S. Lau, J. Zhang, X. Wan, 2014

机译：通过原子层沉积在具有纳米尺寸粗糙度的表面上沉积的非晶薄膜的表面平滑效果

Deposition of amorphous fluorosilane thin film on silicon surface: Atomic simulation

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