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首页> 外文期刊>Journal of Micromechanics and Microengineering >Fabrication of a uniform microlens array over a large area using self-aligned diffuser lithography (SADL)
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Fabrication of a uniform microlens array over a large area using self-aligned diffuser lithography (SADL)

机译:使用自对准扩散光刻(SADL)在大面积上制造均匀的微透镜阵列

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摘要

We describe a simple and effective method to fabricate a uniform plastic microlens array (MLA) with high fill-factor over a large area utilizing self-aligned diffuser lithography (SADL). In order to make an intimate contact between the photomask and the positive photoresist during 3D diffuser lithography, which is crucial for obtaining a uniform MLA mold over a large area, we fabricated a self-aligned metal mask directly on top of the positive photoresist, eliminating any air gap between the metal mask and the underlying photoresist. After replication of the developed concave MLA mold onto the poly(dimethylsiloxane) (PDMS), a standard deviation of sag (height) of the MLA was observed by laser scanning confocal lithography. The standard deviation, which indicates uniformity, was reduced by as much as a factor of 6 by applying SADL compared with that obtained from conventional diffuser lithography. Using this method, we fabricated a 7 inch MLA sheet with excellent uniformity. The proposed method can be extensively applied for fabrication of large-size MLA sheets with plastic materials thanks to its simplicity and versatility.
机译:我们描述了一种简单有效的方法,利用自对准扩散光刻技术(SADL)在大面积上制造具有高填充因子的均匀塑料微透镜阵列(MLA)。为了在3D扩散器光刻过程中使光掩模与正性光刻胶之间紧密接触,这对于在大面积上获得均匀的MLA模具至关重要,我们直接在正性光刻胶上制造了自对准金属掩模,从而消除了金属掩模和下面的光刻胶之间的任何气隙。将显影的凹面MLA模具复制到聚(二甲基硅氧烷)(PDMS)后,通过激光扫描共聚焦光刻法观察到MLA的下垂(高度)的标准偏差。与从常规扩散器光刻技术获得的标准偏差相比,使用SADL可以将表明均匀性的标准偏差降低多达6倍。使用这种方法,我们制造了具有出色均匀性的7英寸MLA板。所提出的方法由于其简单性和多功能性而可以广泛地用于用塑料材料制造大型MLA片材。

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