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Preparation of Barium Ferrite Thin Film Deposited on the Phase Separated Al-Si Thin Film

机译:相分离Al-Si薄膜上沉积钡铁氧体薄膜的制备

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摘要

Barium ferrite (BaM) is considered to be an excellent candidate for magnetic recording medium because of its high anisotropy field, mechanical hardness, and chemical stability. It is especially advantageous for the near contact mode magnetic recording without any over coating. But the BaM films with c-axis perpendicular orientation possess a relatively low H{sub}(C⊥) that may be attributed to a magnetic coupling between the grains and a formation of multi-domain structures due to the grain growth. To minimize this problem one of the remedies is to prepare magnetic grains isolated by the non-magnetic material. In our previous study, it has been found that, Al underlayer can improve the crystallographic property of BaM thin film remarkably and hence reduces the crystallization temperature to near about 600℃ by flash annealing process. Whereas BaM thin film deposited on the Si (111) substrate was amorphous at the same annealing temperature. Al and Si are immiscible into each other, therefore Al and Si will remain separately in an Al-Si films. If BaM deposited on this Al-Si layer, it is expected that the BaM grains deposited on the Al part can be crystallized and surrounded by the amorphous BaM matrix deposited on Si part.
机译:铁氧体钡(BaM)由于其高各向异性场,机械硬度和化学稳定性而被认为是磁记录介质的极佳候选者。对于没有任何覆盖的近接触模式磁记录特别有利。但是,具有c轴垂直取向的BaM膜具有相对较低的H {sub}(C⊥),这可能归因于晶粒之间的磁耦合以及由于晶粒生长而形成的多畴结构。为了使这个问题最小化,补救措施之一是制备被非磁性材料隔离的磁性颗粒。在我们以前的研究中,已经发现,Al底层可以显着改善BaM薄膜的晶体学性能,从而通过快速退火工艺将结晶温度降低到600℃左右。而在相同的退火温度下,沉积在Si(111)衬底上的BaM薄膜是非晶态的。 Al和Si彼此不溶混,因此Al和Si将分别保留在Al-Si膜中。如果BaM沉积在该Al-Si层上,则期望沉积在Al部分上的BaM晶粒可以被结晶并且被沉积在Si部分上的非晶BaM基体包围。

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