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Lens wavefront compensation for 3D photomask effects in subwavelength optical lithography

机译：亚波长光学光刻中的3D光掩模效应的透镜波前补偿

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摘要

As semiconductor optical lithography is pushed to smaller dimensions, resolution enhancement techniques have been required to maintain process yields. For some time, the customization of illumination coherence at the source plane has allowed for the control of diffraction order distribution across the projection lens pupil. Phase shifting at the photomask plane has allowed for some phase control as well. Geometries smaller than the imaging wavelength introduce complex wavefront effects that cannot be corrected at source or mask planes. Three-dimensional photomask topography effects can cause a loss of both focal depth and exposure latitude across geometry of varying density. Wavefront manipulation at the lens pupil plane becomes necessary to provide the degrees of freedom needed to correct for such effects. The focus of this research is the compensation of the wavefront phase error introduced by the topographical photomask structures of high resolution phase shift masking combined with off-axis illumination. The compensation is realized through phase manipulation of the lens pupil plane, specifically in the form of spherical aberration. Subwavelength resolution optimization and imaging is presented showing how phase pupil filtering can measurably improve the depth of focus for several photomask structures and types.
机译：随着半导体光学平版印刷术被推向更小尺寸，已经需要分辨率增强技术来保持工艺产量。一段时间以来，在源平面上照明相干的自定义允许控制投影透镜光瞳上的衍射级分布。在光掩模平面上的相移也允许一些相位控制。小于成像波长的几何形状会引入复杂的波前效应，这些波前效应无法在源或掩模平面上进行校正。三维光掩模的地形效应会导致密度变化的几何图形的焦深和曝光范围的损失。为了提供校正这种效果所需的自由度，必须在透镜光瞳平面上进行波前操纵。这项研究的重点是对高分辨率相移掩膜和离轴照明相结合的地形光掩膜结构引入的波前相位误差的补偿。补偿是通过对镜头光瞳平面进行相位控制来实现的，特别是采用球差的形式。提出了亚波长分辨率优化和成像，显示了相位光瞳滤波如何可测量地改善几种光掩模结构和类型的聚焦深度。

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