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Measuring two-dimensional profiles of beam spots in a high-density spot array for a maskless lithography system

机译：在无掩模光刻系统中测量高密度光斑阵列中束斑的二维轮廓

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We measure two-dimensional (2D) profiles of beam spots in a high-density spot array for a maskless lithography system. Since the size of each spot is comparable to that of a pixel in a charge-coupled device (CCD), we detect image frame data, which are the distribution of the intensity of the spot overlapped on the active area of the pixel in the CCD, by scanning with a nano-stage. Using the image frame data of the scanning CCD we determine reconstructed images of the beam spot array. We calculate the 2D profile of each spot by taking the deconvolution of the reconstructed image of the spot with the active area of the CCD pixel. We theoretically analyze the uncertainty in the measurement of profiles in terms of spot size for the variation of the scanning step of the nano-stage and determine the step size to achieve uncertainty of less than 100 nm. We experimentally demonstrate the measurement of profiles of an 11 x 11 spot array for the proof of concept. Also, we analyze various parameters of the spot array, such as ellipticity, rotation of the spot profile, spot size, intensity distribution, and position. (C) 2014 Optical Society of America
机译：我们为无掩模光刻系统测量高密度光斑阵列中束斑的二维（2D）轮廓。由于每个点的大小都可以与电荷耦合器件（CCD）中像素的大小相媲美，因此我们可以检测图像帧数据，即重叠在CCD像素有效区域上的点的强度分布，通过纳米平台扫描。使用扫描CCD的图像帧数据，我们确定束斑阵列的重建图像。我们通过将点的重建图像与CCD像素的有效面积进行反卷积来计算每个点的2D轮廓。我们从理论上分析了纳米级扫描步骤变化时光斑尺寸方面的测量不确定性，并确定了达到100 nm以下不确定性的步长。我们通过实验演示了11 x 11点阵列的轮廓测量，以验证概念。此外，我们分析了点阵列的各种参数，例如椭圆度，点轮廓的旋转，点大小，强度分布和位置。 （C）2014年美国眼镜学会

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